In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 49, No. 12R ( 2010-12-01), p. 125802-
Abstract:
Photoinduced current transient spectroscopy was used to investigate the defect states and capture kinetics of charge carriers for traps in low temperature polycrystalline silicon (poly-Si) films. A broad deep trap was found to be located 0.30 eV from the conduction band edge of poly-Si with capture cross section of 1.51×10 -15 cm 2 . The variation of the trap capture kinetics with filling pulse time showed extended traps and linear arrays of traps, which might be grain boundary defects. Proton implantation and H-plasma treatment were used to improve poly-Si device characteristics, with traps more effectively suppressed by the former treatment. The ionized hydrogen atoms implanted into the poly-Si films are imputed to amorphize the defective poly-Si film with post-annealing enhancing re-crystallization, resulting films with fewer defects.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.49.125802
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2010
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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