In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, American Vacuum Society, Vol. 16, No. 5 ( 1998-09-01), p. 3076-3079
Abstract:
Polyimide (C22H10N2O5)n films were irradiated at room temperature by 200, and 300 keV Yb+ and 400 keV Er+. The dose was 1×1015 ions/cm2. The Rutherford backscattering technique has been used to study the diffusion behavior and the depth distribution of implanted Yb+ and Er+ in polyimide (C22H10N2O5)n. The results show that (1) for the sample annealed at lower temperature, the migration of Yb+ and Er+ into the overlying polyimide is faster than into the undamaged polyimide, but there is a significant non-Fickian tail extending deep into the undamaged polyimide film, (2) oxygen loss was observed, and (3) the depth distributions of “as implanted” Yb+ and Er+ were nearly Gaussian in all cases. The x-ray photoelectron spectroscopy was used to study the structural modification. After ion implantation, the binding energy of carbon 1s, nitrogen 1s and oxygen 1s in polyimide was decreased.
Type of Medium:
Online Resource
ISSN:
0734-2101
,
1520-8559
Language:
English
Publisher:
American Vacuum Society
Publication Date:
1998
detail.hit.zdb_id:
1475424-1
detail.hit.zdb_id:
797704-9
Permalink
