In:
Journal of Applied Physics, AIP Publishing, Vol. 79, No. 2 ( 1996-01-15), p. 1060-1064
Abstract:
Al+ ions have been implanted in silica glass at an acceleration energy of 200 eV and doses ranging from 1×1013 to 1×1017 ions cm−2. Infrared reflection spectra and ultraviolet, visible, and near-infrared absorption spectra have been measured. It was found that refractive index of silica glass increased by 6%–10% after implantation of 1×1017 Al+ ions cm−2. It was deduced that this refractive index change is caused by the formation of Si—Si homobonds, but not by the decrease in Si—O—-Si bond angle which leads to compaction.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
1996
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
Permalink