In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 12, No. 6 ( 1994-11-01), p. 3760-3764
Abstract:
A new phase-shifting mask repair concept, transferred image correction (TRIC), for repairing shifter void defects is proposed. TRIC repair fills shifter voids with an opaque material by focused ion beam (FIB) deposition, in which a FIB tool is used to partially remove Cr adjacent to the void. The transferred image of a TRIC-repaired mask pattern corresponds to that of the original mask pattern with no defects.
Type of Medium:
Online Resource
ISSN:
1071-1023
,
1520-8567
Language:
English
Publisher:
American Vacuum Society
Publication Date:
1994
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
3117333-0
detail.hit.zdb_id:
1475429-0
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