In:
Chinese Journal of Liquid Crystals and Displays, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Vol. 32, No. 10 ( 2017), p. 799-803
Materialart:
Online-Ressource
ISSN:
1007-2780
Originaltitel:
PS-VA模式中RM残留量对信赖性的影响
DOI:
10.3788/YJYXS/2017/32/10
DOI:
10.3788/YJYXS20173210.0799
Sprache:
Englisch
,
Chinesisch
Verlag:
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
Publikationsdatum:
2017
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