In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 10R ( 1997-10-01), p. 6195-
Abstract:
A high-sensitivity preferential etching technique is presented to evaluate crystal defects in a highly As-doped silicon crystal with a resistivity lower than 0.01 Ω· cm. For highly doped n-type Si, a conventional preferential etching technique, such as Secco etching, Wright etching or Dash etching becomes less useful because of a significant decrease in defect detection sensitivity. The new method is quite sensitive to dislocations, stacking faults and oxygen precipitates in highly As-doped crystals with a surface of either (111) or (100). In this method, copper is first decorated at the defect site, then the defect is preferentially etched by a dilute alkaline solution. The technique thus offers us a sensitive and Cr-free method, attractive from an environmental aspect. A correlation between the laser scattering method is also obtained for the oxygen precipitate density.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.6195
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1997
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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