In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 33, No. 2A ( 1994-02-01), p. L177-
Abstract:
A novel method for optical lithography using a resist with nonlinear photosensitivity and the multiple exposure technique is described. By means of this method, the diffraction-limited optical cutoff frequency is raised markedly, which cannot be realized by any of the other methods proposed previously. A brief explanation of the principle is given and computer simulations are demonstrated.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.33.L177
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1994
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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