In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 30, No. 12B ( 1991-12-01), p. L2113-
Kurzfassung:
Oxygen-doped ZrF 4 -based fluoride glass film is synthesized by plasma-enhanced chemical vapor deposition (PCVD) and the effects of oxygen doping on thermal properties are investigated. The oxygen-doped fluoride glass film has a slightly higher glass-transition temperature and a wider T x - T g gap than fluoride glass prepared by the melt-casting method without oxygen doping. The glass forming region in the ZrF 4 -BaF 2 system is significantly improved by oxygen doping. Oxygen ions, which are distributed homogeneously in the fluoride glass film by PCVD, strengthen the structural network of the fluoride glass, which improves its stability against crystallization.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.30.L2113
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
1991
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7
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