In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 49, No. 5R ( 2010-05-01), p. 055702-
Abstract:
We investigated the NO adsorption process on Si(001)-(2×1) and the oxygen adsorption process on potassium-covered Si(001)-(2×1) by reflectance difference spectroscopy (RDS). In both cases, the time courses that deviated from a simple Langmuirian kinetics could not be well fitted with a single exponential function, indicating the involvement of two different processes. In NO adsorption, a highly coordinated nitrogen adsorption site (N≡Si 3 ) might play a role in the initial reaction process, producing an inhomogeneous strain on the first layer of oxynitride. In potassium-assisted oxidation, a sudden decrease in RD intensity just after oxygen exposure is associated with a reaction of oxygen with a potassium film, and the subsequent oxidation is slightly enhanced by the potassium–oxygen complex.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.49.055702
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2010
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
2006801-3
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