In:
Acta Physica Sinica, Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences, Vol. 31, No. 1 ( 1982), p. 71-
Abstract:
Semi-insulating GaAs substrates doped with chromium were implanted with 120-160 ke V28Si+ ions (1012-1013 cm-2 at room temperature. After thermal annealing, the carrier concentration and mobility profiles, residual damage and impurity levels of implanted wafer were determined by C-V method, back scattering technique and photo-1uminescence spectra. The results showed that the semi-insulating GaAs substrate selection and 28Si+ beam purity control are necessary to obtain reproducible and high activation implantation. Fabricated with multiple localized silicon implantation for both active and contact layer, GaAs dual-gate MES FET applicated in UHF TV tuner reached a noise figure of 0.9 dB and an associated gain of 10 dB at 1 GHz. The mobility profile and appropriate annealing temperature are discussed on the basis of the present experimental results.
Type of Medium:
Online Resource
ISSN:
1000-3290
,
1000-3290
Language:
Unknown
Publisher:
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Publication Date:
1982
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