In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 12S ( 1997-12-01), p. 7570-
Abstract:
In order to obtain the low-stress absorber for the X-ray mask, we have investigated the internal stress and the microstructures of WN x bilayer films with the structure of amorphous/crystalline phases. WN x film goes through a transition from an amorphous phase to a crystalline phase as the N 2 content in the working gas increases. WN x bilayer film was prepared by two-step sputtering with varying N 2 content of 10% for the crystalline phase and 5% for the amorphous phase. Precise stress control of the film was carried out by step annealing in a N 2 atmosphere. We could obtain the internal film stress of less than 10 MPa by step annealing. The WN x bilayer film exhibits a very smooth surface with roughness of less than 1 nm and a long term stress stability less than of 2 MPa in air.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.7570
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1997
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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