In:
Materials Science Forum, Trans Tech Publications, Ltd., Vol. 449-452 ( 2004-3), p. 285-288
Abstract:
Nanosized ITO powder was fabricated by homogeneous precipitation which used formamide as a precipitator. ITO thin film was deposited by RF magnetron sputtering using ITO target which was prepared by sintering of nanosized ITO powder. From the accelerated degradation test with stress factor of temperature, the lifetime estimate, degradation rate/degree, activation energy and etc. were calculated. It was showed that under thermal condition, the prominent failure mechanism of degradation was the decrease of oxygen vacancies due to oxidation of ITO thin film.
Type of Medium:
Online Resource
ISSN:
1662-9752
DOI:
10.4028/www.scientific.net/MSF.449-452
DOI:
10.4028/www.scientific.net/MSF.449-452.285
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2004
detail.hit.zdb_id:
2047372-2
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