In:
Acta Physica Sinica, Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences, Vol. 36, No. 5 ( 1987), p. 591-
Abstract:
Small-angle X-ray diffraction study of amorphous a-Si:H/(a-SiNx:H) periodical multilayer thin films and some single layer films has been undertaken. A number of satellite peaks were found in the lower side of Bragg diffraction peaks of multilayer thin films with a less number of periods. A number of diffraction peaks were also found for the small-angle diffraction of single layer films. We have presented a simple formula for calculating the X-ray diffraction intensity of multilayer and single layer films. A satisfactory explaination of experimental results was obtained. Consequently, a simple method for measuring the total thickness of both multilayer and single layer thin films has been presented.
Type of Medium:
Online Resource
ISSN:
1000-3290
,
1000-3290
Language:
Unknown
Publisher:
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Publication Date:
1987
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