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  • Oda, Osamu  (2)
  • Unknown  (2)
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  • 1
    Online Resource
    Online Resource
    IOP Publishing ; 1999
    In:  Japanese Journal of Applied Physics Vol. 38, No. 2S ( 1999-02-01), p. 977-
    In: Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 2S ( 1999-02-01), p. 977-
    Abstract: 100-mm-diameter 〈 100 〉 undoped InP single crystals were grown by the vertical gradient freezing (VGF) method using a high-pressure furnace. In order to reduce the temperature fluctuation in the furnace for preventing twinning during crystal growth, we investigated the gas flow in the furnace by a computer simulation. The simulation results showed that the gas flow was quite unstable because of the collision between the gas and the hot-zone or other gas flows. After we developed a hot-zone to control the gas flow, the temperature fluctuation near the seed crystal reduced from ±0.3°C to ±0.03°C. The axial temperature gradient was lower than 10°C/cm and the growth rate was higher than 0.4 mm/h. Twin-free 100-mm-diameter single crystals could be obtained for the first time under these conditions. The average EPD(Etch Pit Density) of the grown crystals was about 2000 cm -2 , less than that of the conventional 75-mm-diameter InP LEC (liquid encapsulated Czochralski) crystals.
    Type of Medium: Online Resource
    ISSN: 0021-4922 , 1347-4065
    RVK:
    RVK:
    RVK:
    Language: Unknown
    Publisher: IOP Publishing
    Publication Date: 1999
    detail.hit.zdb_id: 218223-3
    detail.hit.zdb_id: 797294-5
    detail.hit.zdb_id: 2006801-3
    detail.hit.zdb_id: 797295-7
    Location Call Number Limitation Availability
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  • 2
    Online Resource
    Online Resource
    IOP Publishing ; 1999
    In:  Japanese Journal of Applied Physics Vol. 38, No. 2S ( 1999-02-01), p. 985-
    In: Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 2S ( 1999-02-01), p. 985-
    Abstract: Semi-insulating (SI) InP has been industrially produced by doping Fe atoms as deep acceptors. Fe concentrations in InP are, however, largely varied from top to tail along the crystal growth axis due to impurity segregation. In the present work, we have examined the possibility of vapor-phase Fe doping for fabrication of 50- and 75-mm-diameter SI InP wafers with constant Fe concentrations using a wafer annealing procedure. A small amount of Fe was charged with red phosphorus in ampoules in which InP wafers were annealed. It was found that the vapor-phase doping is effective for Fe doping of InP. The present technology can be applied for the fabrication of low Fe-doped SI InP wafers with similar Fe concentrations of all wafers from one InP ingot.
    Type of Medium: Online Resource
    ISSN: 0021-4922 , 1347-4065
    RVK:
    RVK:
    RVK:
    Language: Unknown
    Publisher: IOP Publishing
    Publication Date: 1999
    detail.hit.zdb_id: 218223-3
    detail.hit.zdb_id: 797294-5
    detail.hit.zdb_id: 2006801-3
    detail.hit.zdb_id: 797295-7
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
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