Publikationsdatum:
2018-06-22
Beschreibung:
Publication date: September 2018 Source: Vacuum, Volume 155 Author(s): Xiaoming Gao, Jiayi Sun, Yanlong Fu, Dong Jiang, Desheng Wang, Lijun Weng, Ming Hu The goal of this paper was to investigate the structural/mechanical properties of arc-ion-plated Ti film deposited at ultralow temperature (166 K, LT-Ti film) and its effect as an interlayer on the wear resistance of sputtered WS 2 film. The results revealed that the LT-Ti film mainly exhibited ω-phase structure due to the insufficient mobility of Ti adatoms at LT surface, while the α-phase was predominated in the Ti film deposited at room temperature (RT-Ti film). The LT-Ti film showed a higher hardness than the RT-Ti film as well as the better toughness and film-substrate adhesion on steel substrates. The wear resistance of sputtered WS 2 film could be significantly improved by employing the Ti films as its interlayer, especially for the LT-Ti film.
Print ISSN:
0042-207X
Digitale ISSN:
1879-2715
Thema:
Maschinenbau
,
Physik
