Skip to main content
Log in

The effect of emitter geometry on lateral field emission diodes fabricated by AFM-based electrochemical nanolithography

  • Original Paper
  • Published:
Journal of Solid State Electrochemistry Aims and scope Submit manuscript

Abstract

Lateral field emission diodes were successfully fabricated using atomic force microscopy (AFM)-based electrochemical nanolithography and tetramethyl ammonium hydroxide (TMAH) wet etching method. Field emission (FE) current of the silicon emitter cathode was measured as a function of the applied anode voltage under vacuum environment. For narrowed nanogaps from 55 to 35 nm, the turn-on voltage was decreased from 21 to 16 V. The turn-on voltage of the 35 nm gap was reduced from 16 to 8 V by changing the curvature radius of the cathode tip. The sharper emitter had the lowest turn-on voltage, largest field-enhancement factor, and good stability, which were attributed to the small emitter radius at the cathode tip and very slight changes in the local field factor. These results indicate that the diodes fabricated using this technique had the lowest value of turn-on voltage ever reported for lateral silicon FE devices.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7

Similar content being viewed by others

References

  1. Milne W, Teo K, Mann M, Bu I, Amaratunga G, De Jonge N, Allioux M, Oostveen J, Legagneux P, Minoux E (2006) Carbon nanotubes as electron sources. Phys Status Solidi A 203:1058–1063

    Article  CAS  Google Scholar 

  2. Zhou J, Xu NS, Deng SZ, Chen J, She JC, Wang ZL (2003) Large‐area nanowire arrays of molybdenum and molybdenum oxides: synthesis and field emission properties. Adv Mater 15:1835–1840

    Article  CAS  Google Scholar 

  3. Temple D, Palmer W, Yadon L, Mancusi J, Vellenga D, McGuire G (1998) Silicon field emitter cathodes: fabrication, performance, and applications. J Vac Sci Technol A 16:1980

    Article  CAS  Google Scholar 

  4. Kang W, Davidson J, Wong Y, Holmes K (2004) Diamond vacuum field emission devices. Diamond Relat Mater 13:975–981

    Article  CAS  Google Scholar 

  5. Milne W, Teo K, Amaratunga G, Legagneux P, Gangloff L, Schnell JP, Semet V, Binh VT, Groening O (2004) Carbon nanotubes as field emission sources. J Mater Chem 14:933–943

    Article  CAS  Google Scholar 

  6. Ha B, Seo SH, Cho JH, Yoon CS, Yoo J, Yi GC, Park CY, Lee CJ (2005) Optical and field emission properties of thin single-crystalline GaN nanowires. J Mater Chem B 109:11095–11099

    CAS  Google Scholar 

  7. Chen Y, Pepin A (2001) Nanofabrication: conventional and nonconventional methods. Electrophoresis 22:187–207

    Article  CAS  Google Scholar 

  8. McCreery RL (2004) Molecular electronic junctions. Chem Mater 16:4477–4496

    Article  CAS  Google Scholar 

  9. Tsutsui M, Taniguchi M, Kawai T (2008) Fabrication of 0.5 nm electrode gaps using self-breaking technique. Appl Phys Lett 93:163115

    Article  Google Scholar 

  10. Chen F, Qing Q, Ren L, Wu Z, Liu Z (2005) Electrochemical approach for fabricating nanogap electrodes with well controllable separation. Appl Phys Lett 86:123105, 123105–123103

    Article  Google Scholar 

  11. Kanda A, Wada M, Hamamoto Y, Ootuka Y (2005) Simple and controlled fabrication of nanoscale gaps using double-angle evaporation. Phys E Low Dimen Syst Nanostruct 29:707–711

    Article  CAS  Google Scholar 

  12. Hoffmann R, Weissenberger D, Hawecker J, Stoffler D (2008) Conductance of gold nanojunctions thinned by electromigration. Appl Phys Lett 93:043118, 043118–043113

    Article  Google Scholar 

  13. Rouhi J, Mahmud S, Hutagalung SD, Kakooei S (2011) Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography. J Micro/Nanolith MEMS MOEMS 10:043002

    Article  Google Scholar 

  14. Rouhi J, Mahmud S, Hutagalung SD, Kakooei S (2012) Optimization of nano-oxide mask fabricated by atomic force microscopy nanolithography: a response surface methodology application. Micro Nano Lett 7:325–328

    Article  Google Scholar 

  15. Pal P, Sato K, Shikida M, Gosálvez MA (2009) Study of corner compensating structures and fabrication of various shapes of MEMS structures in pure and surfactant added TMAH. Sensors Actuators A Phys 154:192–203

    Article  CAS  Google Scholar 

  16. Fowler RH, Nordheim L (1928) Electron emission in intense electric fields. Proc R Soc Lond Ser A Cont Pap Math Phys Charact 119:173–181

    Article  CAS  Google Scholar 

  17. Rouhi J, Mahmud S, Hutagalung S, Naderi N (2012) Field emission in lateral silicon diode fabricated by atomic force microscopy lithography. Electron Lett 48:712–714

    Article  CAS  Google Scholar 

  18. Park JH, Lee HI, Tae HS, Huh JS, Lee JH (1997) Lateral field emission diodes using SIMOX wafer. IEEE Trans Electron Devices 44:1018–1021

    Article  CAS  Google Scholar 

  19. Shin H, Yang S, Hwang T, Han S, Lee J, Lee YD (1999) Lateral silicon field emission devices using electron beam lithography. Jpn J Appl Phys 39:134–135

    Google Scholar 

Download references

Acknowledgments

The authors gratefully acknowledge that this work was partially supported by the NANO-SciTech Centre at the Institute of Science (IOS) in the Universiti Teknologi MARA.

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Jalal Rouhi.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Rouhi, J., Mahmood, M.R., Mahmud, S. et al. The effect of emitter geometry on lateral field emission diodes fabricated by AFM-based electrochemical nanolithography. J Solid State Electrochem 18, 1695–1700 (2014). https://doi.org/10.1007/s10008-014-2403-5

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10008-014-2403-5

Keywords

Navigation