In:
e-Polymers, Walter de Gruyter GmbH, Vol. 5, No. 1 ( 2005-12-1)
Abstract:
Herein we present a novel polyether(meth)acrylate-based resin material for stereolithography and other photolithographic applications with outstanding flexible material characteristics. This group of photopolymeric resin products combines the advantages of a non-toxic (meth)acrylate-based process material with a broad spectrum of adjustable low Young’s modulus material characteristics. In contrast to the mostly rigid and non-flexible process materials used at the moment in the engineering world, these formulations are able to fulfil the extended need for a very flexible and also biocompatible engineering material, especially for threedimensional models or prototypes in the medical technology area. A short overview over the bandwidth of possible material characteristics is given in this publication.
Type of Medium:
Online Resource
ISSN:
1618-7229
,
2197-4586
DOI:
10.1515/epoly.2005.5.1.377
Language:
Unknown
Publisher:
Walter de Gruyter GmbH
Publication Date:
2005
detail.hit.zdb_id:
2060396-4
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