In:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 30, No. 6 ( 2012-11-01)
Abstract:
The authors report on the development of a self-aligned double layer resist processing technique that allows incorporation of ion channel nanopores into on-chip microfluidic channels. The patterned positive/negative electron-beam resist double layer acts as a sacrificial template for the fabrication of on-chip fluidic channels and the nanopores. By controlling the resist dimensions, it was possible to tailor the shape of the on-chip fluidic channel and the nanopore dimensions. Using this technique, the authors demonstrated the fabrication of sub-10 nm nanopore arrays on 2 μm wide and 800 nm high on-chip fluidic channels. With further developments, it will be possible to have controllable on-chip nanopores with integrated nanofluidics.
Type of Medium:
Online Resource
ISSN:
2166-2746
,
2166-2754
Language:
English
Publisher:
American Vacuum Society
Publication Date:
2012
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
1475429-0
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