In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 37, No. 12S ( 1998-12-01), p. 6984-
Abstract:
High-quality ZnO film and highly wettable polymethylmethacrylate (PMMA) are
obtained by using a keV ion beam. ZnO films are grown on glass substrates by ion beam sputter deposition, changing the oxygen/argon gas ratio, ion beam energy, and
substrate temperature. Physical properties of ZnO films were investigated by X-ray diffraction, Rutherford backscattering spectroscopy, and the Van der Pauw method. All
the films show a strong preferred orientation along the c -axis. The electrical resistivity
is varied from 10 -3 to 10 6 Ωcm and its dependence on the deposition parameters is
discussed. The PMMA surface was modified by the ion-assisted reaction technique. Ion dose, ion energy, and oxygen gas flow rate are varied from 5×10 15 to 1×10 17 ions/cm 2 ,
from 0.6 to1.2 kV, and from 0 to 8 ml/min, respectively. A highly wettable PMMA surface can be obtained by irradiating oxygen ions in an oxygen gas environment. X-ray
photoelectron spectroscopi c analysis shows that hydrophilic groups are formed on the
surface of PMMA.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.37.6984
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1998
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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