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  • 1995-1999  (2)
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3115-3120 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Reflectance anisotropy spectroscopy was used to examine the surfaces of AlxGa1−xAs layers grown on GaAs(001) by molecular beam epitaxy, where the Al mole fraction was varied across the whole composition range x=(0.0,0.25,0.50,0.75,1.0). All surfaces were also independently characterized using reflection high-energy electron diffraction, and were found to exhibit a c(4×4) reconstruction. After initial changes in the spectra were observed on depositing very thin layers (≤20 monolayers), in the intermediate thickness range a regime was entered in which strong optical interference effects appeared. These effects are accurately accounted for using a four-media model. For thicker layers (≥8000 monolayers), interference effects were seen to diminish and spectra representative of the surfaces of bulk AlxGa1−xAs were obtained. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We present in this study reflectance anisotropy spectra also termed reflectance difference spectra for the surfaces of thick Al(x)Ga(1−x)As (x=0.0, 0.25, 0.50, 0.75, 1.00) layers grown on GaAs(001) by molecular beam epitaxy (MBE). Layers ≥2 μm thick were grown in order to minimize the interference effects from the buried interface and to obtain spectra representative of bulk Al(x)Ga(1−x)As surfaces. All surfaces were also independently characterized using reflection high energy electron diffraction (RHEED), and found to exhibit a c(4×4) reconstruction. The reflectance anisotropy spectra were qualitatively similar to one another, but showed clear dependence of energy and magnitude upon the mole fraction x. These spectra can serve as reference for determining stochiometries in MBE growth of Al(x)Ga(1−x)As and probably should be useful for future comparison to metalorganic vapor phase epitaxy (MOVPE) Al(x)Ga(1−x)As growth. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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