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  • 1995-1999  (4)
  • 1
    Electronic Resource
    Electronic Resource
    A picosecond electron gun for surface analysis (1995)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 66 (1995), S. 1000-1009 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Theoretical and experimental investigations for a new design of an ultrashort pulsed laser activated electron gun for time resolved surface analysis are described. In addition, a novel electron detection and image analysis system, as it applies specifically to time resolved reflection high-energy electron diffraction in the multiple-shot operation, are reviewed. Special attention is directed to minimize the photoelectron transit-time spread from the electron gun, in spite of an unusually long focal length and a small convergence angle of the pulsed electron beam. Both requirements are necessary to use the electron gun for diffraction techniques. The design value for the temporal resolution in the synchroscan operation is 1.3 ps. Based on a thorough theoretical investigation, a new electron gun has been designed, constructed, and tested. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1146036
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Observation of surface enhanced multiphoton photoemission from metal surfaces in the short pulse limit (1995)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 102 (1995), S. 8606-8613 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: Photoelectrons with excess kinetic energy corresponding to several absorbed photons above the work function have been measured from atomically clean Cu(110) and Cu(100) surfaces under ultrahigh vacuum conditions. The power dependence of the photoemission yield does not follow a simple power law dependence corresponding to the number of photons absorbed. This behavior is reminiscent of other above threshold ionization (ATI) or tunnel ionization (TI) processes observed for atoms in the gas phase. The photoelectrons are generated with laser pulsewidths less than 100 fs in duration and peak powers as low as 100 MW/cm2. These intensities are on the order of 105 times lower than that required to observe similar phenomena in the gas phase. The relatively low intensities and correlation with surface roughness suggests a contribution from a surface enhancement mechanism. Thermal heating and space charge effects have been ruled out, and the possibility of electric field enhancement at the surface due to the coupling of photons into surface plasmons is discussed. The nonlinear yield and enhancement of the photoemission produced by short pulse excitation needs to be considered when discussing photoinduced hot electron reaction channels at metal surfaces. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.468962
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  • 3
    Electronic Resource
    Electronic Resource
    Preparation of model catalysts by laser interference nanolithography followed by metal cluster deposition (1998)
    Springer
    Catalysis letters 56 (1998), S. 1-6 
    Details
    ISSN: 1572-879X
    Keywords: nanolithography ; model catalyst ; palladium ; copper ; stability ; spin-coating ; SEM ; AFM ; XPS
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract Metal clusters arranged on nanostructured oxidized silicon wafers are presented as new model catalyst systems. A photoresist layer spun on top of a wafer was patterned by laser interference exposure. The grid obtained after removing the exposed parts of the resist is used as an etching mask. Hollows with diameters of 300 nm and depths between 50 and 60 nm were etched into the oxide layer using wet chemical methods. Two methods were applied to deposit metal clusters (Pd or Cu) in a defined way within the hollows. The particles ranged from 10 to 50 nm in height and from 80 to 200 nm in diameter. The model catalyst systems were characterized by atomic force microscopy and X-ray photoelectron spectroscopy. The method presented here allows us to produce 4 inch wafers that are covered completely by nanometer-sized structures in a reasonable period of time.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1023/A:1019080222823
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  • 4
    Electronic Resource
    Electronic Resource
    Time-resolved 2-photon photoionization on metallic nanoparticles (1999)
    Springer
    Applied physics 68 (1999), S. 415-418 
    Details
    ISSN: 1432-0649
    Keywords: PACS: 78.47.+p; 71.24.+q; 72.15.Lh
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s003400050642
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